top of page

Welcome
Upcoming Events
Visit Us
Memberships
Our Community & Blog
Online Courses
Gift Shop
Pattern Database for Members
Our Team
FAQ
News
Sponsorships
Past Exhibitions
Contact Us
- Privacy Policy
- Terms
More

Use tab to navigate through the menu items.

Heim

Year:

1963

Pattern Number:

1261

Pattern Company:

Vogue

One piece dress and coat

Heim

Heim

Heim

Heim

Heim

Heim

Exhibition History

Your support makes a difference! Couture Pattern Museum is fiscally sponsored by Creative Visions, a 501(c)(3) nonprofit organization that supports creative activists, those that use the arts and media to ignite social change. Contributions for the charitable purposes of Couture Pattern Museum (CPM) must be made payable to “Creative Visions” only and are tax-deductible to the extent permitted by law.

Donations received will be used in accordance with the mission and operations of Couture Pattern Museum under the careful oversight and approval of our Fiscal Sponsor, Creative Visions. We strictly adhere to all applicable laws, grant terms, and foundation requirements in the management and application of these funds. Your generous contributions not only support our ongoing efforts to preserve and promote the lost story of the democratization of couture patterns, but they also reinforce our commitment to transparency, accountability, and the highest standards of fiscal responsibility. We deeply appreciate your trust and support in our work.

Subscribe for Updates

©2019 - 2024

Couture Pattern Museum

Member of the Arts District of Santa Barbara

Professional Member of the American Alliance of Museums

American Alliance of Museums (AAM)

As a professional member of the American Alliance of Museums (AAM), CPM is committed to upholding the highest standards of professionalism and quality in the museum sector.

Non-affiliation disclaimer

Any designer product names, logos, brands, and other trademarks or images featured or referred to within couturepatternmuseum.com and/or on any social media forum are the property of their respective trademark holders. These trademark holders do not sponsor or endorse couturepatternmuseum.com or any of its products or comments. We declare no affiliation, sponsorship, or partnerships with any designer-registered trademarks. couturepatternmuseum.com operates independently as an educational museum website. couturepatternmuseum.com does not claim any right to any of the designer trademarks, logos, or brands referred to within this website. If you have any questions or concerns, please check out our Terms of Use or get in touch with us here.

Couture Pattern Museum Accessibility Statement

At the Couture Pattern Museum, we're dedicated to making our website easy to use for everyone, no matter their abilities or the device they're using. We aim to follow the best practices for web accessibility according to the Web Content Accessibility Guidelines (WCAG). We use the All in One Accessibility Pro tool from Skynet Technologies to help us achieve this. Our site is built to follow the WCAG guidelines from the World Wide Web Consortium (W3C), so it's accessible for people with disabilities, including vision impairments, cognitive disabilities, and more. We're always working to keep our site accessible. We regularly check, evaluate, and test our site to make sure we're meeting or exceeding accessibility standards. We're working hard to make our site accessible for everyone, and we appreciate your patience. Your thoughts and experiences matter to us. If you come across any problems or have ideas on how we can improve, we'd love to hear from you. If you have any feedback or run into any issues, please get in touch with us through the Contact Us form.

Non-Discrimination Policy of Couture Pattern Museum

Statement of Policy: The Couture Pattern Museum (CPM) is committed to fostering an environment that celebrates diversity, inclusivity, and equal opportunity. We firmly believe in the value of different perspectives, backgrounds, and cultures, and we strive to create a space where all individuals feel respected and valued.

bottom of page